NIST Technicalendar August 3 to August 7, 2009 The NIST Technicalendar is issued each Friday. All items MUST be submitted electronically from this web page by 12:00 NOON each Wednesday unless otherwise stated in the NIST Technicalendar. The address for online weekly editions of the NIST Technicalendar and NIST Administrative Calendar is: http://www.nist.gov/tcal.

In this Issue: Meetings at NIST Meetings Elsewhere Announcements Talks by NIST Personnel NIST Web Site Announcements NIST Administrative Calendar (current)   NIST Vacancy Announcements (current)

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10:30 AM - Nanometer-Scale Metrology Projects at the National Measurement Laboratory in Taiwan
1:30 PM - Combined Scanning Probe Microscopy and Micro/Nano Raman studies of modern Nanostructures
2:00 PM - Indentation Responses of Compliant Materials and Adhesive Systems

9:00 AM - 2009 SURF Colloquium
10:30 AM - Mobility and Morphology of Graphene Grown Epitaxially on Silicon Carbide

No Scheduled Events

No Scheduled Events

No Scheduled Events

8/3 -- MONDAY

10:30 AM - POLYMERS DIVISION SEMINAR: Nanometer-Scale Metrology Projects at the National Measurement Laboratory in Taiwan
Wei-En Fu , Center for Measurement Standards, ITRI.
224 Bldg, Rm. A312. (NIST Contact: Wen-li Wu, 301-975-6839, wenli@nist.gov)

1:30 PM - CNST NANOFAB SEMINAR: Combined Scanning Probe Microscopy and Micro/Nano Raman studies of modern Nanostructures
We will demonstrate various applications of confocal Raman/fluorescence microscope integrated with Atomic Force Microscope (AFM) to investigate modern nanostructures. First, we report on "classical" applications of such combination, when 2D AFM and confocal Raman maps are acquired simultaneously from the same part of the sample, but "independently" one from another. Physical characterization and modification capabilities of AFM merge with chemical resolution of confocal Raman microscope and general capabilities of optical microscope to provide complete information about sample investigated. Diffraction limited resolution of 2D Raman maps is 200 nm. We demonstrate results on various promising nanoelectronics materials: grapheme flakes, carbon nanotubes, semiconductor nanowires etc. The ultimate goal of integrating AFM with Raman/fluorescence spectroscopy is to break diffraction limit and to bring spatial resolution of optical methods down to resolution of AFM (a few nm). We present results of Tip Enhanced Raman Spectroscopy (TERS) mapping experiments realized using integrated AFM-Raman system. Measurements are realized in two different excitation configurations: Inverted (for transparent samples) and Upright (reflected light configuration, for opaque samples). In both geometries we demonstrate near field Raman enhancement effect due to resonant interaction of light with localized surface plasmon at the apex of a metal AFM probe. Various samples are studied by TERS technique: thin metal oxide layers, fullerenes, strained silicon, carbon nanotubes, and grapheme. Actual plasmonic and near field nature of the Raman enhancement is proven by a number of ways: dependence of the enhancement on the excitation wavelength and polarization, enhancement versus tip-sample distance curves, observation of selective enhancement of Raman signal from thin surface layers of the sample etc. Finally, the ultimate performance of TERS is demonstrated by measuring Raman 2D maps with sub wavelength resolution – determined not by the wavelength of light, but by the localization area of the surface plasmon electromagnetic field.
Pavel Sergeevich Dorozhkin , General manager, Optics & Spectroscopy products. Oleg Gennadievich Butyaev and John Janzer
Bldg. 217, Rm. H107. (NIST Contact: Vincent Luciani, 301-975-2886, vincent.luciani@nist.gov)

2:00 PM - CERAMICS DIVISION SEMINAR: Indentation Responses of Compliant Materials and Adhesive Systems
Compliant and adhesive materials are of importance for much of the medical community, with applications in MEMS for diagnostics and in composite devices such as hydrogel-coated glucose sensors. The characterization and analysis of compliant and adhesive systems is complex due to the nature of the physical phenomenon and the difficulties that occur when trying to test these compliant systems at small length scales. Polymers, hydrogels and biological materials are examined using micro- and nanoindentation to characterize adhesion and time-dependent deformation. Both viscoelasticity and poroelasticity are considered. Preliminary results are presented for adhesive characterization using a wide range of indenter radii. This work has opened many interesting questions regarding the way adhesive interactions occur in indentation techniques, and how we model time-dependent adhesive systems.
Tamaryn Shean , Cambridge University. Michelle Oyen, Cambridge University
Materials Bldg, Rm. A252. (NIST Contact: Robert Cook, 301-975-3207, robert.cook@nist.gov)


8/4 -- TUESDAY

9:00 AM - MANUFACTURING ENGINEERING LABORATORY OFFICE SEMINAR: 2009 SURF Colloquium
This summer's Summer Undergraduate Research Fellowship (SURF) program is our largest yet, with 151 students from all over the United States including Puerto Rico, and 71 different colleges and universities. The students come to NIST to spend the summer working with our scientists on a research project. The summer's program culminates in a four-day colloquium wherein the students present a 15-minute talk on their summer research. The colloquium is set up similar to many professional conferences - starting with a plenary session on the morning of Tuesday, August 4, 2009 (9:00 a.m. - 12:55 p.m.) in the Green Auditorium. The colloquium continues that afternoon (2:30 p.m. - 4:00 p.m.) with a parallel session in Lecture Rooms A, B, & C. Additional parallel sessions will be held Wednesday - Thursday, with parallel sessions in Lecture Rooms A, B, & C & the Employee Lounge. A detailed schedule can be seen at http://www.surf.nist.gov/pdf/09colloq.pdf.
Lisa Fronczek , SURF Program.
Administration Bldg, Green Auditorium. (NIST Contact: Lisa Fronczek, 301-975-6633, lisa.fronczek@nist.gov) http://www.surf.nist.gov/pdf/09colloq.pdf
Special Assistance Available

10:30 AM - SEMICONDUCTOR ELECTRONICS DIVISION SEMINAR: Mobility and Morphology of Graphene Grown Epitaxially on Silicon Carbide
Joseph Tedesco , Navel Research Lab.
225 Bldg, Rm. A362. (NIST Contact: Curt Richter, 301-975-2082, curt.richter@nist.gov)


8/5 -- WEDNESDAY

No Scheduled Events

8/6 -- THURSDAY

No Scheduled Events

8/7 -- FRIDAY

No Scheduled Events

ADVANCE NOTICE

8/12/09 1:00 PM - 2009 RESEARCH ADVISORY COLLOQUIUM SERIES: Negative Refraction and Negative Radiation Pressure
Four decades ago, V. Veselago derived the electromagnetic properties of a hypothetical material having simultaneously-negative values of electric permittivity and magnetic permeability. Such a "left-handed" material was predicted to exhibit a number of exotic properties including a negative index of refraction and a negative response to radiation pressure (pull). Since left-handed materials are not available in nature, considerable efforts are currently under way to implement them under the form of artificial "metamaterials" – composite media with tailored bulk optical characteristics resulting from constituent structures which are smaller than the effective wavelength in the medium. This talk shows how surface-plasmon modes propagating in a stacked array of metal-insulator-metal (MIM) waveguides can be harnessed to yield a volumetric left-handed metamaterial characterized by an in-plane-isotropic index of refraction which is negative over a broad portion of the visible-frequency range. By sculpting this metamaterial with a focused-ion beam, micro-cantilevers are realized and used to demonstrate for the first time, a negative radiation pressure. A negative "super-pressure" of magnitude significantly greater than the largest photon pressure achievable under normal circumstances – that experienced by a perfect mirror, is predicted and experimentally verified.
Henri Lezec , Center for Nanoscale Science and Technology, NIST.
Administration Bldg, Green Auditorium. (NIST Contact: Ajit Jillavenkatesa, 301-975-5089, ajit.jilla@nist.gov)

8/19/09 10:00 AM - ,PTC SEMINAR: CoCreate CAD Software Demo
Parametric Technology Corporation (PTC) would like introduce their CoCreate CAD software and related products to the NIST community. The Instrument Development Engineering Group at the NIST Center for Neutron Research (NCNR) has been using CoCreate CAD software and related products for over 15 years. During that time the software has become one of the top explicit modelers. If interested in attending please contact Daniel Adler by phone at x5792 or email at daniel.adler@nist.gov. For more information on this presentation or the CoCreate products please contact Daniel or visit www.ptc.com/products/cocreate.
Cristina Chin , PTC.
Administration Bldg, Lecture Rm. C. (NIST Contact: Daniel Adler, 301-975-5792, daniel.adler@nist.gov)

8/19/09 10:30 AM - CNST ELECTRON PHYSICS GROUP SEMINAR: INDIVIDUAL ATOMS AND MOLECULES ON INSULATING FILMS STUDIED WITH NONCONTACT AFM
We investigated the charge state switching of individual gold and silver adatoms on ultrathin NaCl films on Cu(111) using a qPlus tuning fork atomic force microscope (AFM) operated at 5 Kelvin with oscillation amplitudes in the sub-Ångstrom regime. Charging of a gold adatom by one electron charge increased the force on the AFM tip by a few piconewtons. Employing Kelvin probe force microscopy (KPFM) we also measured the local contact potential difference (LCPD). We observed that the LCPD is shifted depending on the sign of the charge and allows the discrimination of positively charged, neutral, and negatively charged atoms. Furthermore, we modified AFM tips by means of vertical manipulation techniques, i.e. deliberately picking up known adsorbates, to increase spatial resolution. To study the effect of the atomic tip termination we used different well defined tip terminations to image individual pentacene molecules. We compare our experimental results with density functional theory (DFT) calculations to gain insight on the physical origin of contrast formation on the atomic scale.
Leo Gross , Postdoctoral Fellow/IBM Research, Zurich.
Bldg.217, Rm.H107. (NIST Contact: Rachel Cannara, 301-975-4258, rachel.cannara@nist.gov)

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MEETINGS ELSEWHERE


8/3 -- MONDAY

No Scheduled Events

8/4 -- TUESDAY

No Scheduled Events

8/5 -- WEDNESDAY

No Scheduled Events

8/6 -- THURSDAY

No Scheduled Events

8/7 -- FRIDAY

No Scheduled Events

ADVANCE NOTICE

No Scheduled Events

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TALKS BY NIST PERSONNEL

RICHTER, L. : MOLECULAR CHARACTERIZATION OF ORGANIC SEMICONDUCTORS FOR THIN FILM TRANSISTORS.
SPIE Optics + Photonics, San Diego Convention Center, San Diego, CA, 8/3.

ROBEY, S. : INTERFACIAL MOLECULAR AND ELECTRONIC STRUCTURE AT FULLERENE-DONOR HETEROJUNCTIONS.
NanoScience & Engineering - SPIE, San Diego Convention Center, San Diego, CA, 8/4.

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ANNOUNCEMENTS

PUBLICATIONS PRINTING DEADLINE, AUGUST 14, 2009
August 14 is the last day in FY 2009 to submit materials using FY 2009 funds to the Electronic Information and Publications Group (EIPG) for printing at the Department of Commerce or Government Printing Office. To assure timely processing, bring your Editorial Review Board-approved document or administrative printing job and appropriate paperwork to the EIPG office by close of business on Friday, August 14, 2009. The office is located on the mezzanine floor of the NIST Research Library in the Administration Building, Room E220. Questions? Ilse Putman, x2780 or Barbara Silcox, x2146.
NIST Contact: Ilse Putman, 301-975-2780, ilse.putman@nist.gov

VISITOR REGISTRATION FOR NIST EVENTS
Because of heightened security at the NIST Gaithersburg site, members of the public who wish to attend meetings, seminars, lectures, etc. must first register in advance. For more information please call or e-mail the "NIST Contact" for the particular event you would like to attend.
NIST Contact: . ., ., .

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NIST WEB SITE ANNOUNCEMENTS

No Web Site announcements this week.

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For more information, contact Ms. Sharon Hallman, Editor, Stop 2500, National Institute of Standards and Technology, Gaithersburg MD 20899-2500; Telephone: 301-975-TCAL (3570); Fax: 301-926-4431; or Email: tcal@nist.gov.

All lectures and meetings are open unless otherwise stated.

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